Interface study of Sc/Si multilayers
Sc / Si多层膜的界面研究
作者: Jingtao ZhuBin JiHui JiangJie ZhuShengming ZhuMiao LiJiayi Zhang
作者单位: 1MOE Key Laboratory of Advanced Micro-structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
2Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204, China
刊名: Applied Surface Science, 2020, Vol.515
来源数据库: Elsevier Journal
DOI: 10.1016/j.apsusc.2020.146066
关键词: MultilayersInterfaceDiffusion barrier layerAnnealingSc/Si
英文摘要: Abstract(#br)The properties of the interfaces of the Sc/Si multilayers are evaluated utilizing grazing incident X-ray reflection, X-ray diffraction and X-ray scattering. The process of amorphous-to-crystalline transition was studied. A series of Sc/Si multilayers with and without B 4 C diffusion barrier layer at different interfaces were fabricated. The interface properties of Sc-on-Si and Si-on-Sc, including roughness and diffusion, were characterized separately. The asymmetry property of two interfaces was confirmed. The scattering measurements results show that, Sc/B 4 C/Si and B 4 C/Sc/B 4 C/Si multilayers are similar and narrower comparing with the results of Si/B 4 C/Sc and Sc/Si multilayers. The X-ray diffraction results show that, the Si/B 4 C/Sc multilayers were stability until...
全文获取路径: Elsevier  (合作)
影响因子:2.112 (2012)

  • barrier 堡坝
  • Annealing 退火
  • layer 
  • study 学习