EUV soft X-ray characterization of a FEL multilayer optics damaged by multiple shot laser beam
作者: A. GigliaN. MahneA. BiancoC. SvetinaS. Nannarone
作者单位: 1CNR-IOM Laboratorio TASC, SS 14 km 163,5, 34149 Basovizza, Trieste, Italy
2Sincrotrone Trieste S.C.p.A., SS 14 km 163,5, 34149 Basovizza, Trieste, Italy
3Università di Modena e R.E., Dipartimento Ingegneria Materiali, via Vignolese 905/a, Modena, Italy
刊名: Nuclear Inst. and Methods in Physics Research, A, 2010, Vol.635 (1), pp.S30-S38
来源数据库: Elsevier Journal
DOI: 10.1016/j.nima.2010.10.026
关键词: Damage thresholdMultilayerFree-electron laser
原始语种摘要: Abstract(#br)We have investigated the damaging effects of a femtosecond pulsed laser beam with 400nm wavelength on a Mo/Si EUV multilayer. The exposures have been done in vacuum with multiple pulses (5pulses/mm 2 ) of 120fs varying the laser fluence in the 38–195mJ/cm 2 range. The analysis of the different irradiated regions has been performed ex-situ by means of different techniques, including specular and diffuse reflectivity, X-ray photoemission spectroscopy (XPS) and total electron yield (TEY) in the EUV and soft X-ray range. Surface images have been acquired by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Results clearly indicate a progressive degradation of the EUV multilayer...
全文获取路径: Elsevier  (合作)

  • multilayer 多层的
  • laser 激光
  • photoemission 光电发射
  • microscopy 显微镜检查
  • vacuum 真空
  • electron 电子
  • atomic 原子的
  • specular 镜的
  • reflectivity 反射比
  • degradation 减嚣夷酌