Analysis of periodic Mo/Si multilayers: Influence of the Mo thickness
作者: H. MauryJ.-M. AndréK. Le GuenN. MahneA. GigliaS. NannaroneF. BridouF. DelmotteP. Jonnard
作者单位: 1UPMC Univ. Paris 06, CNRS–UMR 7614, Laboratoire de Chimie Physique–Matière et Rayonnement, 11 rue Pierre et Marie Curie, F-75231 Paris Cedex 05, France
2TASC-INFM National Laboratory, S.S. 14, Km 163.5 in Area Science Park, I-34012 Basovizza, Trieste, Italy
3Laboratoire Charles Fabry de l’Institut d’Optique, CNRS, Univ. Paris-Sud, Campus Polytechnique, RD128, F-91127 Palaiseau Cedex, France
刊名: Surface Science, 2008, Vol.603 (2), pp.407-411
来源数据库: Elsevier Journal
DOI: 10.1016/j.susc.2008.12.002
关键词: SuperlatticesRoughnessX-ray emissionX-ray reflectionX-ray scatteringCrystalline–amorphous interfacesMolybdenumSilicon
英文摘要: Abstract(#br)A set of Mo/Si periodic multilayers is studied by non-destructive analysis methods. The thickness of the Si layers is 5nm while the thickness of the Mo layers changes from one multilayer to another, from 2 to 4nm. This enables us to probe the effect of the transition between the amorphous and crystalline state of the Mo layers near the interfaces with Si on the optical performances of the multilayers. This transition results in the variation of the refractive index (density variation) of the Mo layers, as observed by X-ray reflectivity (XRR) at a wavelength of 0.154nm. Combining X-ray emission spectroscopy (XES) and XRR, the parameters (composition, thickness and roughness) of the interfacial layers formed by the...
全文获取路径: Elsevier  (合作)
影响因子:1.838 (2012)

  • thickness 厚度
  • periodic 周期的
  • amorphous 非晶质的
  • scattering 散射
  • reflection 反射
  • Analysis 分析
  • emission 发射