Effects of magnetic field strength and deposition pressure on the properties of TiN films produced by high power pulsed magnetron sputtering (HPPMS)
作者: Jian WuB.H. WuD.L. MaD. XieY.P. WuC.Z ChenY.T. LiH. SunN. HuangY.X. Leng
作者单位: 1Key Laboratory of Advanced Technologies of Materials, Ministry of Education of China, School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu 610031, China
2School of Physical Science and Technology, Southwest Jiaotong University, Chengdu 610031, China
3State Key Laboratory of Physical Chemistry of Surface, Jiangyou, Sichuan 621700, China
刊名: Surface & Coatings Technology, 2017, Vol.315 , pp.258-267
来源数据库: Elsevier Journal
DOI: 10.1016/j.surfcoat.2017.02.051
关键词: High power pulsed magnetron sputteringMagnetic fieldDeposition pressureTitanium nitrideDeposition rateFilm properties
英文摘要: Abstract(#br)The drawbacks of titanium nitride (TiN) films deposited by high power pulsed magnetron sputtering (HPPMS) are low deposition rate (compared with conventional magnetron sputtering) and high residual stress. Many methods have been used to deal with these issues. In this study, TiN films were deposited by HPPMS at different magnetic field strength B s (40 and 115mT) and deposition pressure P d (0.2, 1.0, and 2.0Pa). The effects of B s and P d on film deposition rate, residual stress, and mechanical properties were also investigated. The plasma in the HPPMS discharge was diagnosed by optical emission spectroscopy. Due to the stronger magnetic confinement and back-attraction around the target at higher B s (115mT), lower B s...
全文获取路径: Elsevier  (合作)
影响因子:1.941 (2012)

  • magnetron 磁控管
  • properties 道具
  • sputtering 溅射
  • pulsed 脉冲
  • deposition 沉积
  • pressure 压力
  • films 薄膜
  • produced 出品
  • field 
  • strength 强度