Optimization of Optical Parameters of Metal-Dielectric Heterostructures for Plasmonic Sensors Formation
 作者： L. V. Poperenko, A. L. Yampolskiy, O. V. Makarenko, O. I. Zavalistyi 作者单位： 1Taras Shevchenko National University of Kyiv, 60 Volodymyrska Str., UA-01033 Kyiv, Ukraine 刊名： Metallofiz. Noveishie Tekhnol., 2019, Vol.41 (06), pp.751-764 来源数据库： G.V. Kurdyumov Institute for Metal Physics, National Academy of Science of the Ukraine DOI： 10.15407/mfint.41.06.0751 关键词： Multilayer structures;  Dielectric layer;  Ellipsometry;  Surface plasmon;  Biosensors.; 原始语种摘要： Angular dependences of ellipsometric parameters $\psi$ and $\Delta$ at external reflection as well as an internal reflection coefficient are experimentally measured for hybrid structures based on thin Au, Ag or Cu films protected by dielectric layers HfO$_2$ or MgF$_2$. Using numerical matrix method, appropriate angular dependences for such multilayer systems are calculated. Despite of the differences obtained at modelling of optical parameters of the objects between the ordinary (external reflection) and plasmonic (internal reflection) modes, the theoretical results are in good agreement with the experimental data. Angular positions of plasmonic attenuated internal reflection minima in Kretschmann geometry for the samples are calculated as functions of a refractive index $n$ of a... substance deposited onto appropriate samples. The shift of these minima is practically the same for each of the structures studied and amounts about of 100 deg/RIU in the vicinity of $n$ = 1.20. This allows one to estimate the performance of given heterostructures functioning as sensors grounded on the effect of surface plasmon resonance.

• layer
• parameters　参数
• calculated　计算的
• plasmon　细胞质基因
• reflection　反射
• dielectric　电介质
• refractive　折射率
• grounded　接地的
• agreement　协议
• appropriate　适当的