Optimization of Optical Parameters of Metal-Dielectric Heterostructures for Plasmonic Sensors Formation
作者: L. V. Poperenko, A. L. Yampolskiy, O. V. Makarenko, O. I. Zavalistyi
作者单位: 1Taras Shevchenko National University of Kyiv, 60 Volodymyrska Str., UA-01033 Kyiv, Ukraine
刊名: Metallofiz. Noveishie Tekhnol., 2019, Vol.41 (06), pp.751-764
来源数据库: G.V. Kurdyumov Institute for Metal Physics, National Academy of Science of the Ukraine
DOI: 10.15407/mfint.41.06.0751
关键词: Multilayer structuresDielectric layerEllipsometrySurface plasmonBiosensors.
原始语种摘要: Angular dependences of ellipsometric parameters $\psi$ and $\Delta$ at external reflection as well as an internal reflection coefficient are experimentally measured for hybrid structures based on thin Au, Ag or Cu films protected by dielectric layers HfO$_2$ or MgF$_2$. Using numerical matrix method, appropriate angular dependences for such multilayer systems are calculated. Despite of the differences obtained at modelling of optical parameters of the objects between the ordinary (external reflection) and plasmonic (internal reflection) modes, the theoretical results are in good agreement with the experimental data. Angular positions of plasmonic attenuated internal reflection minima in Kretschmann geometry for the samples are calculated as functions of a refractive index $n$ of a...
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  • layer 
  • parameters 参数
  • calculated 计算的
  • plasmon 细胞质基因
  • reflection 反射
  • dielectric 电介质
  • refractive 折射率
  • grounded 接地的
  • agreement 协议
  • appropriate 适当的