Vacuum spark point source for x-ray/EUV lithography
作者: Xioming GuoMeisheng XuRubin YeChaofeng HuangKazimierz W. WirpszoEmilio Panarella
作者单位: Advanced Laser and Fusion Technology, Inc. (Canada)
论文集英文名称: SPIE Advanced Lithography
来源数据库: SPIE-the International Society for Optical Engineering
DOI: 10.1117/12.436649
原始语种摘要: The Vacuum Spark X-ray Source (VSX) embodies a miniature, high-repetition rate discharge emitting radiation in a broad spectrum optimized to emit soft X-rays with about 10 + wavelength. We have obtained over 100 (mu) J of energy per pulse in a narrow bandwidth centered around 7 Angstroms and pulse width less than 30 ns. The system operates with an ALFT proprietary pulser that yields a power output of 1 to 10 Watts of X-rays. A proprietary nested cone collimator is used to optimize the collection of the solid angle and direct parallel radiation towards the wafer. We predict this design will yield a throughput of 5 to 20 WLPH on 200 mm wafers. Presently, we are validating results obtained in the 1 - 5 WLPH range. ALFT's goal is to create an X-ray Point Source suitable for Next Generation...
全文获取路径: SPIE 

  • spark 火花
  • design 设计
  • point 
  • proprietary 控股
  • technical 技术的
  • development 开发
  • optimize 优选
  • repetition 重复
  • Source 索尔斯
  • pulser 脉冲发生器