Force microscopy imaging of photopatterned organosilane monolayers: application to probe alignment in AFM patterning following photolithography
| 作者： | H. Sugimura, N. Nakagiri |
| 作者单位： |
1Tsukuba Research Laboratory, Nikon Co., 5-9-1 Tokodai, Tsukuba 300-26, Japan |
| 刊名： | Applied Physics A Materials Science & Processing, 1998, Vol.66 (1), pp.S427-S430 |
| 来源数据库： | Springer Journal |
| DOI： | 10.1007/s003390051176 |
| 关键词： | PACS: 82.65.-i; 82.80.-d; 68.60.-p; |
