Investigation of the thermal stability of Mg/Co periodic multilayers for EUV applications
作者: M.-H. HuK. GuenJ.-M. AndréS. K. ZhouH. C. LiJ. T. ZhuZ. S. WangC. MenyN. MahneA. GigliaS. NannaroneI. EstèveM. WallsP. Jonnard
作者单位: 1Laboratoire Chimie Physique—Matière Rayonnement, UPMC Univ Paris 06, CNRS UMR 7614
2Institute of Precision Optical Engineering, Department of Physics, Tongji University
3Institut de Physique et Chimie des Matériaux de Strasbourg, CNRS UMR 7504
4CNR-IOM Laboratorio TASC
5Dipartimento Ingegneria Materiali, Università di Modenae R.E.
6Institut de Minéralogie et de Physique des Milieux Condensés, Univ Paris 06 et 07, CNRS UMR 7590
7Laboratoire de Physiques des Solides, CNRS UMR 8502, Univ Paris Sud
刊名: Applied Physics A, 2012, Vol.106 (3), pp.737-745
来源数据库: Springer Journal
DOI: 10.1007/s00339-011-6681-9
英文摘要: Abstract(#br)We present the results of the characterization of Mg/Co periodic multilayers and their thermal stability for the EUV range. The annealing study is performed up to a temperature of 400 ∘ C. Images obtained by scanning transmission electron microscopy and electron energy loss spectroscopy clearly show a good quality of the multilayer structure. The measurements of the EUV reflectivity around 25 nm (∼49 eV) indicate that the reflectivity decreases when the annealing temperature increases above 300 ∘ C. X-ray emission spectroscopy is performed to determine the chemical state of the Mg atoms within the Mg/Co multilayer. Nuclear magnetic resonance used to determine the chemical state of the Co atoms and scanning electron microscopy images of cross sections of the Mg/Co multilayers...
全文获取路径: Springer  (合作)
影响因子:1.545 (2012)

  • periodic 周期的
  • thermal 热的
  • stability 稳定性
  • applications 应用程序